6inch SiC Epitaxiy wafer N/P mofuta amohela customized
Mokhoa oa ho lokisa silicon carbide epitaxial wafer ke mokhoa o sebelisang theknoloji ea Chemical Vapor Deposition (CVD).Lintlha tse latelang ke melao-motheo e amehang ea tekheniki le mehato ea ts'ebetso ea boitokiso:
Molao-motheo oa tekheniki:
Chemical Vapor Deposition: Ho sebelisoa khase e tala karolong ea khase, tlas'a maemo a itseng a karabelo, e senyeha ebe e beoa holim'a substrate ho etsa filimi e tšesaane e lakatsehang.
Karabelo ea khase ea khase: Ka pyrolysis kapa karabelo e phatlohileng, likhase tse fapaneng tse tala tse karolong ea khase li fetoloa ka lik'hemik'hale ka phaposing ea karabelo.
Mehato ea ho itokisa:
Kalafo ea substrate: The substrate e tlas'a tlhoekiso ea holim'a metsi le ho etsoa esale pele ho netefatsa boleng le crystallinity ea epitaxial wafer.
Rection chamber debugging: lokisa mocheso, khatello le sekhahla sa phallo ea kamore ea karabelo le likarolo tse ling ho netefatsa botsitso le taolo ea maemo a karabelo.
Phepelo ea thepa e tala: fana ka lisebelisoa tse tala tsa khase ka phaposing ea karabelo, ho kopanya le ho laola sekhahla sa phallo ha ho hlokahala.
Ts'ebetso ea karabelo: Ka ho futhumatsa kamore ea karabelo, phepelo ea khase e kenella karabelo ea lik'hemik'hale ka phaposing ho hlahisa depositi e lakatsehang, ke hore filimi ea silicon carbide.
Ho pholisa le ho laolla: Qetellong ea karabelo, mocheso o theoleloa butle-butle ho pholile le ho tiisa li-deposit ka kamoreng ea karabelo.
Epitaxial wafer annealing and post-processing: the deposited wafer epitaxial wafer e annealed and post-processed ho ntlafatsa thepa ea eona ea motlakase le optical.
Mehato le maemo a ikhethileng a silicon carbide epitaxial wafer process process e ka fapana ho latela lisebelisoa le litlhoko tse ikhethileng.Lintlha tse ka holimo ke feela mokhoa o akaretsang oa ho phalla le molao-motheo, ts'ebetso e khethehileng e hloka ho lokisoa le ho ntlafatsoa ho latela boemo ba sebele.
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