6inch SiC Epitaxiy wafer N/P mofuta amohela customized

6inch SiC Epitaxiy wafer N/P mofuta o amohela Setšoantšo se ikhethileng

Tlhaloso e Khutšoanyane:

e fana ka 4, 6, 8 inch silicon carbide epitaxial wafer le epitaxial foundry services, tlhahiso (600V ~ 3300V) lisebelisoa tsa matla tse kenyeletsang SBD, JBS, PiN, MOSFET, JFET, BJT, GTO, IGBT joalo-joalo.

Re ka fana ka li-wafers tsa epitaxial tsa 4-inch le 6-inch SiC bakeng sa maqheka a lisebelisoa tsa motlakase ho kenyelletsa SBD JBS PiN MOSFET JFET BJT GTO & IGBT ho tloha 600V ho fihla ho 3300V.

Re romelle lengolo-tsoibila

Lintlha tsa Sehlahisoa

Li-tag tsa Sehlahisoa

Mokhoa oa ho lokisa silicon carbide epitaxial wafer ke mokhoa o sebelisang theknoloji ea Chemical Vapor Deposition (CVD).Lintlha tse latelang ke melao-motheo e amehang ea tekheniki le mehato ea ts'ebetso ea boitokiso:

Molao-motheo oa tekheniki:

Chemical Vapor Deposition: Ho sebelisoa khase e tala karolong ea khase, tlas'a maemo a itseng a karabelo, e senyeha ebe e beoa holim'a substrate ho etsa filimi e tšesaane e lakatsehang.

Karabelo ea khase ea khase: Ka pyrolysis kapa karabelo e phatlohileng, likhase tse fapaneng tse tala tse karolong ea khase li fetoloa ka lik'hemik'hale ka phaposing ea karabelo.

Mehato ea ho itokisa:

Kalafo ea substrate: The substrate e tlas'a tlhoekiso ea holim'a metsi le ho etsoa esale pele ho netefatsa boleng le crystallinity ea epitaxial wafer.

Rection chamber debugging: lokisa mocheso, khatello le sekhahla sa phallo ea kamore ea karabelo le likarolo tse ling ho netefatsa botsitso le taolo ea maemo a karabelo.

Phepelo ea thepa e tala: fana ka lisebelisoa tse tala tsa khase ka phaposing ea karabelo, ho kopanya le ho laola sekhahla sa phallo ha ho hlokahala.

Ts'ebetso ea karabelo: Ka ho futhumatsa kamore ea karabelo, phepelo ea khase e kenella karabelo ea lik'hemik'hale ka phaposing ho hlahisa depositi e lakatsehang, ke hore filimi ea silicon carbide.

Ho pholisa le ho laolla: Qetellong ea karabelo, mocheso o theoleloa butle-butle ho pholile le ho tiisa li-deposit ka kamoreng ea karabelo.

Epitaxial wafer annealing and post-processing: the deposited wafer epitaxial wafer e annealed and post-processed ho ntlafatsa thepa ea eona ea motlakase le optical.

Mehato le maemo a ikhethileng a silicon carbide epitaxial wafer process process e ka fapana ho latela lisebelisoa le litlhoko tse ikhethileng.Lintlha tse ka holimo ke feela mokhoa o akaretsang oa ho phalla le molao-motheo, ts'ebetso e khethehileng e hloka ho lokisoa le ho ntlafatsoa ho latela boemo ba sebele.