Kakaretso e Felletseng ea Mekhoa e Menyane ea ho Deposition Film: MOCVD, Magnetron Sputtering, le PECVD

Tlhahisong ea semiconductor, athe photolithography le etching e le lits'ebetso tse buuoang khafetsa, mekhoa ea ho beha lifilimi ka epitaxial kapa e tšesaane le eona e bohlokoa. Sengoliloeng sena se hlahisa mekhoa e 'maloa e tloaelehileng ea ho beha lifilimi tse tšesaane tse sebelisoang ha ho etsoa chip, ho kenyeletsoaMOCVD, magnetron sputtering, lePECVD.

Hobaneng ha Mekhoa ea Filimi e Thin e le Bohlokoa Tlhahisong ea Chip?

Ho etsa mohlala, ak'u nahane ka bohobe bo sephara bo phehiloeng. Ka bohona, e ka latsoa hamonate. Leha ho le joalo, ka ho hlatsoa bokaholimo ka li-sauces tse sa tšoaneng—joaloka sejo se monate sa linaoa kapa sirapo ea ’mela o monate—u ka fetola tatso ea eona ka ho feletseng. Liaparo tsena tse matlafatsang tatso li tšoana lelifilimi tse tšesaaneka dithulaganyo semiconductor, ha flatbread ka boeona e emelasubstrate.

Ha ho etsoa li-chip, lifilimi tse tšesaane li na le likarolo tse ngata tse sebetsang - insulation, conductivity, passivation, absorption e khanyang, joalo-joalo - 'me mosebetsi o mong le o mong o hloka mokhoa o itseng oa ho beha.

1. Metal-Organic Chemical Vapor Deposition (MOCVD)

MOCVD ke mokhoa o tsoetseng pele haholo le o nepahetseng o sebelisoang bakeng sa ho beha lifilimi le li-nanostructures tsa boleng bo holimo tsa semiconductor. E bapala karolo ea bohlokoa tlhahisong ea lisebelisoa tse kang li-LED, lasers le lisebelisoa tsa elektroniki tsa motlakase.

Likarolo tsa bohlokoa tsa Sisteme ea MOCVD:

• Sistimi ea Phano ea Khase
  E ikarabella bakeng sa kenyelletso e nepahetseng ea li-reactants ka kamoreng ea karabelo. Sena se kenyelletsa taolo ea phallo ea:

• Likhase tse tsamaisang thepa

• Metal-organic precursors

• Likhase tsa Hydride
  Sistimi e na le li-valve tsa litsela tse ngata bakeng sa ho fetola lipakeng tsa kholo le mekhoa ea ho hloekisa.

• Mohaho oa Karabelo
  Pelo ea tsamaiso moo kholo ea sebele ea thepa e hlahang teng. Likaroloana li kenyelletsa:

  • Sesepa sa graphite (setšoantšo sa substrate)

  • Lisebelisoa tsa ho futhumatsa le mocheso

  • Optical ports bakeng sa ho shebella in-situ

  • Matsoho a liroboto bakeng sa ho kenya / ho laolla sephaphatha

• Sistimi ea Taolo ea Kholo
  E na le li-controller tsa logic tse hlophisehang le komporo e amohelang. Tsena li netefatsa ho beha leihlo ka nepo le ho pheta-pheta ts'ebetsong eohle ea ho beha.

• In-situ Monitoring
  Lisebelisoa tse joalo ka pyrometers le reflectometers tekanyo:

  • Botenya ba filimi

  • Mocheso oa bokaholimo

  • Substrate curvature
    Tsena li thusa ho fana ka maikutlo a nako ea 'nete le ho lokisoa.

• Sistimi ea Phekolo ea Exhaust
  E phekola lihlahisoa tse chefo li sebelisa ho bola ha mocheso kapa catalysis ea lik'hemik'hale ho netefatsa polokeho le tumellano ea tikoloho.

Tlhophiso e koetsoeng ea Showerhead (CCS):

Ka li-reactors tsa MOCVD tse otlolohileng, moralo oa CCS o lumella likhase hore li kenngoe ka mokhoa o ts'oanang ka li-nozzles tse chenchanang sebopehong sa lishaoara. Sena se fokotsa ts'ebetso ea pele ho nako mme se ntlafatsa ho kopanya ho tšoanang.

• Theseketsoana sa graphite se potolohangka ho eketsehileng thusa homogenize moeli lera la likhase, ho ntlafatsa ho tšoana filimi ka mose ho sephaphatha.

2. Magnetron Sputtering

Magnetron sputtering ke mokhoa oa 'mele oa ho beha mouoane (PVD) o sebelisoang haholo ho kenya lifilimi tse tšesaane le liphahlo, haholo-holo ho lisebelisoa tsa elektroniki, tsa optics le tsa ceramic.

Molao-motheo oa ho sebetsa:

1. Boitsebiso bo Lebeletsoeng
   Lintho tsa mohloli tse lokelang ho kenngoa-tšepe, oxide, nitride, joalo-joalo - li tsitsitse holim'a cathode.

2. Kamore ea Vacuum
   Mokhoa ona o etsoa tlas'a vacuum e phahameng ho qoba tšilafalo.

3. Moloko oa Plasma
   Khase ea inert, eo hangata e leng argon, e entsoe ka ionized ho theha plasma.

4. Tšebeliso ea Tšimo ea Magnetic
   Matla a khoheli a koalla lielektrone haufi le sepheo ho ntlafatsa katleho ea ionization.

5. Mokhoa oa Sputtering
   Li-ion li hlasela sepheo, li ntša liathomo tse tsamaeang ka phaposing ebe li beha holim'a substrate.

Melemo ea Magnetron Sputtering:

• Tšebeliso ea lifilimi tse tšoanangho pholletsa le dibaka tse kgolo.

• Bokhoni ba ho Deposit Complex Compounds, ho kenyelletsa le li-alloys le lirafshoa.

• Tunable Process Parametersbakeng sa taolo e nepahetseng ea botenya, sebopeho, le sebopeho sa microstructure.

• Boleng bo Phahameng ba Filimie nang le matla a ho khomarela le matla a mochine.

• Tšebelisano e Bophara ea Lintho, ho tloha ho litšepe ho ea ho li-oxide le nitrides.

• Ts'ebetso e tlase ea Mocheso, e loketseng bakeng sa li-substrates tse se nang mocheso.

3. Kemiso ea Mouoane oa Lik'hemik'hale e Matlafalitsoeng ka Plasma (PECVD)

PECVD e sebelisoa haholo bakeng sa ho beha lifilimi tse tšesaane joalo ka silicon nitride (SiNx), silicon dioxide (SiO₂), le silicon ea amorphous.

Molao-motheo:

Ka tsamaiso ea PECVD, likhase tse tlang pele li kenngoa ka kamoreng ea vacuum moo aplasma ea ho ntša khanyae entsoe ka:

• RF excitation

• Matla a phahameng a DC

• Mehloli ea microwave kapa pulsed

Plasma e kenya tšebetsong tšebetso ea mokhahlelo oa khase, e hlahisa mefuta e ts'oarehang e behang substrate ho etsa filimi e tšesaane.

Mehato ea Deposition:

1. Ho thehoa ha Plasma
   E thabisoa ke masimo a motlakase, likhase tse tlang pele ho ionize ho theha li-radicals tse sebetsang le li-ion.

2. Boitšoaro le Lipalangoang
   Mefuta ena e ba le maikutlo a bobeli ha e ntse e atamela substrate.

3. Karabelo ea Bokaholimo
   Ha ba fihla substrate, ba adsorb, ba itšoara, 'me ba etsa filimi e tiileng. Lihlahisoa tse ling li lokolloa e le likhase.

Melemo ea PECVD:

• Uniformity e Ntlesebopehong sa filimi le botenya.

• Ho khomarela ka Matlaesita le ka mocheso o tlase haholo oa deposition.

• Litefiso tse Phahameng tsa Deposition, ho etsa hore e tšoanelehe bakeng sa tlhahiso ea indasteri.

4. Mekhoa e Menyenyane ea ho Etsa Litšoantšiso tsa Lifilimi

Ho utloisisa litšobotsi tsa lifilimi tse tšesaane ho bohlokoa bakeng sa taolo ea boleng. Mekhoa e tloaelehileng e kenyelletsa:

(1) X-ray Diffraction (XRD)

• Morero: Sekaseka meaho ea kristale, mehatla e sa fetoheng, le litsamaiso.

• Molao-motheo: E ipapisitse le Molao oa Bragg, e lekanya hore na X-ray e fapana joang ka thepa ea kristale.

• Lisebelisoa: Crystallography, tlhahlobo ea mohato, tekanyo ea khatello, le tlhahlobo ea filimi e tšesaane.

(2) Ho hlahlobisisa microscope ea Electron (SEM)

• Morero: Sheba sebopeho sa bokaholimo le sebopeho sa microstructure.

• Molao-motheo: E sebelisa lebone la elektrone ho skena sebaka sa sampole. Matshwao a fumanweng (mohlala, dieleketerone tsa bobedi le tse hasaneng ka morao) a senola dintlha tsa bokahodimo.

• Lisebelisoa: Mahlale a lisebelisoa, nanotech, biology, le tlhahlobo ea ho hloleha.

(3) Atomic Force Microscopy (AFM)

• Morero: Bokaholimo ba setšoantšo ka atomic kapa nanometer resolution.

• Molao-motheo: Sesebelisoa se bohale se hlahloba bokaholimo ha se ntse se boloka matla a ho sebelisana kamehla; ho falla ho ea holimo ho hlahisa setšoantšo sa 3D.

• Lisebelisoa: Patlisiso ea nanostructure, tekanyo ea ho hlaka holimo, lithuto tsa biomolecular.