Ho hlwekisa ka metsi (Wet Clean) ke e 'ngoe ea mehato ea bohlokoa lits'ebetsong tsa tlhahiso ea semiconductor, e reretsoeng ho tlosa litšila tse fapaneng holim'a wafer ho netefatsa hore mehato e latelang ea ts'ebetso e ka etsoa holim'a sebaka se hloekileng.
Ha boholo ba disebediswa tsa semiconductor bo ntse bo tswela pele ho fokotseha mme ditlhoko tsa ho nepahala di ntse di eketseha, ditlhoko tsa tekheniki tsa mekgwa ya ho hlwekisa wafer di se di ntse di thatafala haholo. Esita le dikarolwana tse nyane ka ho fetisisa, thepa ya tlhaho, di-ion tsa tshepe, kapa masalla a oxide hodima wafer di ka ama tshebetso ya sesebediswa haholo, ka hona tsa ama tlhahiso le botshepehi ba disebediswa tsa semiconductor.
Melao-motheo ea Bohlokoa ea ho Hloekisa Wafer
Motheo oa ho hloekisa wafer o ho tlosa litšila tse fapaneng ka katleho holim'a wafer ka mekhoa ea 'mele, ea lik'hemik'hale le e meng ho netefatsa hore wafer e na le sebaka se hloekileng se loketseng ts'ebetso e latelang.
Mofuta oa Tšilafalo
Litšusumetso tse ka Sehloohong Litšobotsing tsa Sesebelisoa
| Tšilafalo ea sehlooho | Liphoso tsa paterone
Liphoso tsa ho kenngoa ha li-ion
Liphoso tsa ho senyeha ha filimi tse sireletsang mocheso
| |
| Tšilafalo ea Tšepe | Litšepe tsa Alkali | Ho se tsitse ha transistor ea MOS
Ho senyeha/ho senyeha ha filimi ea heke oxide
|
| Litšepe tse Boima | Keketseho ea hona joale ea ho lutla ha PN junction reverse
Liphoso tsa ho senyeha ha filimi ea heke oxide
Ho senyeha ha bophelo bohle ba bajari ba fokolang
Ho hlahisa sekoli sa lera la oxide se tsosang takatso
| |
| Tšilafalo ea Lik'hemik'hale | Lisebelisoa tsa tlhaho | Liphoso tsa ho senyeha ha filimi ea heke oxide
Mefuta e fapaneng ea filimi ea CVD (linako tsa ho futhumala)
Liphetoho tsa botenya ba filimi ea oxide ea mocheso (oxidation e potlakileng)
Ho ba teng ha mouoane (wafer, lense, seipone, maske, reticle)
|
| Li-Dopants tse sa pheleng (B, P) | Transistor ea MOS Vth e fetoha
Mefuta e fapaneng ea ho hanyetsa pampiri ea poly-silicon le substrate e hanyetsanang haholo
| |
| Metheo e sa pheleng (li-amine, ammonia) le li-acid (SOx) | Ho senyeha ha qeto ea lik'hemik'hale tse matlafalitsoeng ke lik'hemik'hale
Ho ba teng ha tšilafalo ea likaroloana le mouoane o bakoang ke tlhahiso ea letsoai
| |
| Lifilimi tsa Oxide tsa Tlhaho le tsa Lik'hemik'hale ka lebaka la mongobo, moea | Ho hanyetsa ho kopana ho eketsehileng
Ho senyeha/ho senyeha ha filimi ea heke oxide
| |
Haholo-holo, merero ea ts'ebetso ea ho hloekisa wafer e kenyelletsa:
Ho Tlosa Likaroloana: Ho sebelisoa mekhoa ea 'mele kapa ea lik'hemik'hale ho tlosa likaroloana tse nyane tse khomaretsoeng holim'a wafer. Likaroloana tse nyane li thatafalloa ho li tlosa ka lebaka la matla a matla a motlakase a pakeng tsa tsona le holim'a wafer, a hlokang phekolo e khethehileng.
Ho Tloswa ha Dintho tse Entsweng ka Tlhaho: Ditshila tsa tlhaho tse kang mafura le masala a photoresist di ka kgomarela bokahodimo ba wafer. Ditshila tsena hangata di tloswa ho sebediswa di-oxidizing agents tse matla kapa dihlapolli.
Ho Tlosa Ion ea Tšepe: Masalla a ion ea tšepe holim'a wafer a ka senya ts'ebetso ea motlakase 'me a ba a ama mehato e latelang ea ts'ebetso. Ka hona, litharollo tse itseng tsa lik'hemik'hale li sebelisoa ho tlosa li-ion tsena.
Ho Tloswa ha Okside: Ditshebetso tse ding di hloka hore bokahodimo ba wafer bo se ke ba tswa ho dikarolo tsa oxide, jwalo ka silicon oxide. Maemong a jwalo, dikarolo tsa tlhaho tsa oxide di hloka ho tloswa nakong ya mehato e itseng ya ho hlwekisa.
Bothata ba theknoloji ea ho hloekisa wafer bo holim'a ho tlosa litšila ka katleho ntle le ho ama bokaholimo ba wafer hampe, joalo ka ho thibela ho hohlana ha bokaholimo, ho bola, kapa tšenyo e 'ngoe ea' mele.
2. Phallo ea Ts'ebetso ea ho Hloekisa Wafer
Ts'ebetso ea ho hloekisa wafer hangata e kenyelletsa mehato e mengata ho netefatsa hore litšila li tlosoa ka botlalo le ho fihlela sebaka se hloekile ka botlalo.
Setšoantšo: Papiso Pakeng tsa ho Hloekisa Mofuta oa Sehlopha le ho Hloekisa ka Wafer e le 'Ngoe
Mokhoa o tloaelehileng oa ho hloekisa wafer o kenyelletsa mehato e latelang ea mantlha:
1. Ho Hloekisa Pele ho Nako (Ho Hloekisa Pele ho Nako)
Morero oa ho hloekisa pele ho nako ke ho tlosa litšila tse hlephileng le likaroloana tse kholo holim'a wafer, e leng se atisang ho finyelloa ka ho hlatsoa ka metsi a hloekisitsoeng (DI Water) le ho hloekisa ka ultrasound. Metsi a hloekisitsoeng a ka qala ka ho tlosa likaroloana le litšila tse qhibilihisitsoeng holim'a wafer, ha ho hloekisa ka ultrasound ho sebelisa litlamorao tsa cavitation ho roba tlamahano pakeng tsa likaroloana le bokaholimo ba wafer, e leng se etsang hore ho be bonolo ho li tlosa.
2. Ho Hloekisa Lik'hemik'hale
Ho hlwekisa ka lik'hemik'hale ke e 'ngoe ea mehato ea bohlokoa ts'ebetsong ea ho hloekisa li-wafer, ho sebelisoa litharollo tsa lik'hemik'hale ho tlosa lintho tse phelang, li-ion tsa tšepe le li-oxide holim'a li-wafer.
Ho Tlosa Lintho Tse Phelang: Hangata, acetone kapa motsoako oa ammonia/peroxide (SC-1) o sebelisoa ho qhala le ho kopanya litšila tse phelang. Karolelano e tloaelehileng ea tharollo ea SC-1 ke NH₄OH
₂O₂
₂O = 1:1:5, ka mocheso o sebetsang oa hoo e ka bang 20°C.
Ho Tlosa Ion ea Tšepe: Metswako ea asiti ea nitric kapa hydrochloric acid/peroxide (SC-2) e sebelisoa ho tlosa lion tsa tšepe holim'a wafer. Karolelano e tloaelehileng ea tharollo ea SC-2 ke HCl.
₂O₂
₂O = 1:1:6, mocheso o bolokiloe ho hoo e ka bang 80°C.
Ho Tloswa ha Oxide: Ditshebetsong tse ding, ho tloswa ha lera la tlhaho la oxide hodima bokahodimo ba wafer ho a hlokahala, moo ho sebediswang tharollo ya hydrofluoric acid (HF). Karolelano e tlwaelehileng ya tharollo ya HF ke HF.
₂O = 1:50, 'me e ka sebelisoa mochesong oa kamore.
3. Ho Hloekisa ha ho Qetela
Kamora ho hlwekisa ka dikhemikhale, di-wafer hangata di feta mohatong wa ho qetela wa ho hlwekisa ho netefatsa hore ha ho na masalla a dikhemikhale a setseng hodima bokahodimo. Ho hlwekisa ha ho qetela ho sebedisa metsi a hlwekisitsweng haholoholo bakeng sa ho hlatswa ka botlalo. Ho feta moo, ho hlwekisa ka metsi a ozone (O₃/H₂O) ho sebediswa ho tlosa ditshila tse setseng hodima bokahodimo ba di-wafer.
4. Ho omisa
Li-wafer tse hloekisitsoeng li lokela ho omisoa kapele ho thibela matšoao a metsi kapa ho khomaretsoa hape ha litšila. Mekhoa e tloaelehileng ea ho omisa e kenyelletsa ho omisa ka spin le ho hloekisa naetrojene. Ea pele e tlosa mongobo holim'a wafer ka ho potoloha ka lebelo le phahameng, ha ea morao e netefatsa ho omella ka botlalo ka ho foka khase e omileng ea naetrojene holim'a wafer.
Se silafatsang
Lebitso la Tsamaiso ea ho Hloekisa
Tlhaloso ea Motsoako oa Lik'hemik'hale
Lik'hemik'hale
| Likaroloana | Piranha (SPM) | Asiti ea sulfuriki/hydrogen peroxide/metsi a DI | H2SO4/H2O2/H2O 3-4:1; 90°C |
| SC-1 (APM) | Ammonium hydroxide/hydrogen peroxide/metsi a DI | NH4OH/H2O2/H2O 1:4:20; 80°C | |
| Tšepe (eseng koporo) | SC-2 (HPM) | Asiti ea hydrochloric/hydrogen peroxide/metsi a DI | HCl/H2O2/H2O1:1:6; 85°C |
| Piranha (SPM) | Asiti ea sulfuriki/hydrogen peroxide/metsi a DI | H2SO4/H2O2/H2O3-4:1; 90°C | |
| DHF | Hlakola metsi a hydrofluoric acid/DI (a ke ke a tlosa koporo) | HF/H2O1:50 | |
| Lintho tsa tlhaho | Piranha (SPM) | Asiti ea sulfuriki/hydrogen peroxide/metsi a DI | H2SO4/H2O2/H2O 3-4:1; 90°C |
| SC-1 (APM) | Ammonium hydroxide/hydrogen peroxide/metsi a DI | NH4OH/H2O2/H2O 1:4:20; 80°C | |
| DIO3 | Ozone ka metsing a se nang ionized | Metswako e ntlafalitsoeng ea O3/H2O | |
| Oxide ea tlhaho | DHF | Hlapolla metsi a hydrofluoric acid/DI | HF/H2O 1:100 |
| BHF | Asiti ea hydrofluoric e nang le buffered | NH4F/HF/H2O |
3. Mekhoa e Tloaelehileng ea ho Hloekisa Wafer
1. Mokhoa oa ho Hloekisa oa RCA
Mokhoa oa ho hloekisa oa RCA ke o mong oa mekhoa ea khale ka ho fetisisa ea ho hloekisa wafer indastering ea semiconductor, e ntlafalitsoeng ke RCA Corporation lilemong tse fetang 40 tse fetileng. Mokhoa ona o sebelisoa haholo-holo ho tlosa litšila tsa tlhaho le litšila tsa ione ea tšepe 'me o ka phethoa ka mehato e 'meli: SC-1 (Standard Clean 1) le SC-2 (Standard Clean 2).
Tlhoekiso ea SC-1: Mohato ona o sebelisoa haholo-holo ho tlosa litšila le likaroloana tsa tlhaho. Tharollo ke motsoako oa ammonia, hydrogen peroxide le metsi, e leng se etsang lera le lesesaane la silicon oxide holim'a wafer.
Ho Hloekisa ha SC-2: Mohato ona o sebediswa haholoholo ho tlosa ditshila tsa ion tsa tshepe, ho sebediswa motswako wa hydrochloric acid, hydrogen peroxide le metsi. E siya lera le lesesane la ho se ntshe metsi hodima bokahodimo ba wafer ho thibela ho kgutlela morao.
2. Mokhoa oa ho Hloekisa Piranha (Ho Hloekisa Piranha Etch)
Mokhoa oa ho hloekisa Piranha ke mokhoa o sebetsang haholo oa ho tlosa lintho tse phelang, ho sebelisoa motsoako oa sulfuric acid le hydrogen peroxide, hangata ka karolelano ea 3:1 kapa 4:1. Ka lebaka la thepa e matla haholo ea oxidative ea tharollo ena, e ka tlosa lintho tse ngata tse phelang le litšila tse manganga. Mokhoa ona o hloka taolo e tiileng ea maemo, haholo-holo mabapi le mocheso le mahloriso, ho qoba ho senya wafer.
Ho hlwekisa ka ultrasound ho sebedisa phello ya cavitation e hlahiswang ke maqhubu a modumo a maqhubu a hodimo ka hara mokelikeli ho tlosa ditshila hodima bokahodimo ba wafer. Ha ho bapiswa le ho hlwekisa ka ultrasound ya setso, ho hlwekisa ka megasonic ho sebetsa ka maqhubu a hodimo, ho nolofalletsa ho tloswa ha dikarolwana tse nyane ka boholo ntle le ho baka tshenyo bokahodimong ba wafer.
4. Ho Hloekisa Ozone
Theknoloji ea ho hloekisa ozone e sebelisa thepa e matla ea ho oxidation ea ozone ho bola le ho tlosa litšila tsa tlhaho holim'a wafer, qetellong li li fetola carbon dioxide le metsi a se nang kotsi. Mokhoa ona ha o hloke tšebeliso ea lik'hemik'hale tse turang 'me o baka tšilafalo e fokolang ea tikoloho, e leng se etsang hore e be theknoloji e ntseng e hlaha lefapheng la ho hloekisa wafer.
4. Lisebelisoa tsa Ts'ebetso ea ho Hloekisa Wafer
Ho netefatsa katleho le polokeho ea lits'ebetso tsa ho hloekisa wafer, ho sebelisoa lisebelisoa tse fapaneng tse tsoetseng pele tsa ho hloekisa tlhahisong ea semiconductor. Mefuta e meholo e kenyelletsa:
1. Lisebelisoa tsa ho Hloekisa ka Metsi
Lisebelisoa tsa ho hlwekisa ka metsi li kenyelletsa litanka tse fapaneng tsa ho qoelisa, litanka tsa ho hlwekisa tsa ultrasonic, le li-spin dryer. Lisebelisoa tsena li kopanya matla a mechini le li-reagent tsa lik'hemik'hale ho tlosa litšila holim'a wafer. Litanka tsa ho qoelisa hangata li hlomelloa ka litsamaiso tsa taolo ea mocheso ho netefatsa botsitso le katleho ea litharollo tsa lik'hemik'hale.
2. Lisebelisoa tsa ho Hloekisa ka Omi
Lisebelisoa tsa ho hlwekisa ka omileng di kenyeletsa haholo-holo dihlwekisi tsa plasma, tse sebedisang dikarolwana tse nang le matla a mangata plasma ho arabela le ho tlosa masalla hodima bokaholimo ba wafer. Ho hlwekisa plasma ho loketse haholo bakeng sa ditshebetso tse hlokang ho boloka botsitso ba bokaholimo ntle le ho kenya masalla a dikhemikhale.
3. Mekhoa ea ho Hloekisa e Iketsang
Ka katoloso e tsoelang pele ea tlhahiso ea semiconductor, litsamaiso tsa ho hloekisa ka boiketsetso li fetohile khetho e khethiloeng bakeng sa ho hloekisa ka boholo ba wafer. Litsamaiso tsena hangata li kenyelletsa mekhoa ea phetisetso e iketsang, litsamaiso tsa ho hloekisa ka litanka tse ngata, le litsamaiso tsa taolo e nepahetseng ho netefatsa liphetho tse tsitsitseng tsa ho hloekisa bakeng sa wafer ka 'ngoe.
5. Mekhoa ea Nakong e Tlang
Ha disebediswa tsa semiconductor di ntse di tswela pele ho fokotseha, theknoloji ya ho hlwekisa wafer e ntse e fetoha ho ya ditharollong tse sebetsang hantle le tse sireletsang tikoloho. Mahlale a nakong e tlang a ho hlwekisa a tla shebana le:
Ho Tloswa ha Dikaroloana tse ka Tlase ho nanometer: Mahlale a teng a ho hlwekisa a ka sebetsana le dikarolwana tse ka hara nanometer, empa ka phokotso e eketsehileng ya boholo ba sesebediswa, ho tlosa dikarolwana tse ka tlase ho nanometer e tla ba phephetso e ntjha.
Tlhoekiso e Tala le e Sireletsang Tikoloho: Ho fokotsa tshebediso ya dikhemikhale tse kotsi tikolohong le ho ntshetsa pele mekgwa e mengata ya ho hlwekisa e sireletsang tikoloho, jwalo ka ho hlwekisa ozone le ho hlwekisa megasonic, ho tla ba bohlokwa le ho feta.
Maemo a Phahameng a Boiketsetso le Bohlale: Litsamaiso tse bohlale li tla nolofalletsa ho beha leihlo le ho lokisa liparamente tse fapaneng ka nako ea sebele nakong ea ts'ebetso ea ho hloekisa, ho ntlafatsa katleho ea ho hloekisa le katleho ea tlhahiso.
Theknoloji ea ho hloekisa li-wafer, e le mohato oa bohlokoa tlhahisong ea li-semiconductor, e bapala karolo ea bohlokoa ho netefatseng libaka tse hloekileng tsa li-wafer bakeng sa lits'ebetso tse latelang. Motsoako oa mekhoa e fapaneng ea ho hloekisa o tlosa litšila ka katleho, o fana ka sebaka se hloekileng sa substrate bakeng sa mehato e latelang. Ha theknoloji e ntse e tsoela pele, lits'ebetso tsa ho hloekisa li tla tsoela pele ho ntlafatsoa ho fihlela litlhoko tsa ho nepahala ho hoholo le sekhahla se tlase sa liphoso tlhahisong ea li-semiconductor.
Nako ea poso: Mphalane-08-2024