Substrate
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poleiti ea khauta ea silicon (Si Wafer) 10nm 50nm 100nm 500nm Au e Ntle ho Fetisisa bakeng sa LED
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Li-Silicon Wafers tsa Khauta tse 2inch 4inch 6inch Botenya ba Khauta: 50nm (± 5nm) kapa u iketsetse filimi ea Coating Au, bohloeki ba 99.999%
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AlN-on-NPSS Wafer: Aluminium Nitride Layer e Phahameng ka ho Fetisisa holim'a Sapphire Substrate e sa Pholisoang bakeng sa Mocheso o Phahameng, Matla a Phahameng, le Likopo tsa RF.
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AlN ho FSS 2inch 4inch NPSS/FSS AlN template bakeng sa sebaka sa semiconductor
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Gallium Nitride (GaN) Epitaxial E Hōlile ka Sapphire Wafers 4inch 6inch bakeng sa MEMS
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Lilense tsa Precision Monocrystalline Silicon (Si) - Boholo bo Tloaelehileng le Mekhabiso ea Optoelectronics le Imaging ea Infrared
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Lilense tsa Crystal Silicon (Si) tse Khethehileng tsa High-Purity Single (Si) - Boholo bo Ikemetseng le Likhabiso tsa Infrared le THz Application (1.2-7µm, 8-12µm)
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Fesetere ea Optical ea Mohato oa Sapphire, Al2O3 Single Crystal, Bohloeki bo Phahameng, Diameter 45mm, Botenya ba 10mm, Laser Cut 'me e bentšitsoe.
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Fesetere ea Mohato oa Sapphire e Phahameng ka ho Fetisisa, Al2O3 Single Crystal, Transparent Coated, Libopeho tse Khethehileng le boholo bakeng sa Lisebelisoa tsa Optical tse nepahetseng.
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Pin ea Phahamiso ea Sapphire e Phahameng ka ho Fetisisa, Crystal e Hloekileng ea Al2O3 e le 'Ngoe bakeng sa Li-Wafer Transfer Systems - Boholo bo Tloaelehileng, bo tšoarellang bo phahameng bakeng sa likopo tse nepahetseng.
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Industrial Sapphire Lift Rod le Pin, High Hardness Al2O3 Pin ea Sapphire bakeng sa ho sebetsana le Wafer, Radar System le Semiconductor Processing - Diameter 1.6mm ho isa ho 2mm
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Customized Sapphire Lift Pin, High Hardness Al2O3 Single Crystal Optical Parts for Wafer Transfer – Diameter 1.6mm, 1.8mm, Customizable for Industrial Applications